Characterization of the Deposition Behavior and Changes in Bonding Structures of Hexamethyldisiloxane and Decamethylcyclopentasiloxane Atmospheric Plasma‐Deposited Films
Plasma Processes & Polymers
The plasma deposition behavior of hexamethyldisiloxane (HMDSO) and decamethylcyclopentasiloxane (D5) is investigated for an atmospheric pressure plasma jet. The energy‐deficient and monomer‐deficient domains are revealed by normalized parameters and no significant difference between HMDSO and D5 is observed. The results are supported by Fourier‐transform infrared spectroscopy (FTIR) and X‐ray photoelectron spectroscopy. The data is also evaluated using an Arrhenius‐type equation and an empirical equation reported in the literature, but the correlation is not as good as the normalized parameters. Changes in Si–O–Si bonding arrangements are analyzed by deconvolution of the FTIR absorbance band, showing an increase in porous cage structures with higher normalized energy input.
ISSN: 1612-8850, ESSN: 1612-8869
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Gilliam, Mary; Farhat, Susan; Garner, Graham; Stubbs, Barrack; and Peterson, Benjamin, "Characterization of the Deposition Behavior and Changes in Bonding Structures of Hexamethyldisiloxane and Decamethylcyclopentasiloxane Atmospheric Plasma‐Deposited Films" (2019). Chemical Engineering Publications. 6.