Title

Characterization of the Deposition Behavior and Changes in Bonding Structures of Hexamethyldisiloxane and Decamethylcyclopentasiloxane Atmospheric Plasma‐Deposited Films

Document Type

Article

Publication Date

4-12-2019

Publication Title

Plasma Processes & Polymers

Abstract

The plasma deposition behavior of hexamethyldisiloxane (HMDSO) and decamethylcyclopentasiloxane (D5) is investigated for an atmospheric pressure plasma jet. The energy‐deficient and monomer‐deficient domains are revealed by normalized parameters and no significant difference between HMDSO and D5 is observed. The results are supported by Fourier‐transform infrared spectroscopy (FTIR) and X‐ray photoelectron spectroscopy. The data is also evaluated using an Arrhenius‐type equation and an empirical equation reported in the literature, but the correlation is not as good as the normalized parameters. Changes in Si–O–Si bonding arrangements are analyzed by deconvolution of the FTIR absorbance band, showing an increase in porous cage structures with higher normalized energy input.

Volume

16

Issue

7

DOI

10.1002/ppap.201900024

ISSN

ISSN: 1612-8850, ESSN: 1612-8869

Rights

Copyright © 1999-2019 John Wiley & Sons, Inc. All rights reserved

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